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Rotatable Si Target：
Application:Make for SiO2film,Si3N4 film,mainly used in optical glass AR film,Low-e glass coating film,Semiconductor electronics,Planner Display,Tough screen glass and etc.
Chemical Form:Si
Process:Spraying
Resistivity(20℃):100-430?.cm
Density:≧2.23g/cm3(≧96%)
Purity:≧99.99%
Max impurity content:(ppm,Total impurity content≦1000ppm)
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Al |
≦200 |
B |
≦100 |
Fe |
≦200 |
|
O |
≦5000 |
N |
≦200 |
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Max Processed Size:
Length 4000M
Thickness 6-13MM
Straight Type,Dog bone Type(As customer’s requirement)
